By Semiconductor Process
CVD / LPCVD Thin Film Deposition
High-temperature, chemically resistant quartz components for CVD and LPCVD process tubes. Designed for cleanability and resistance to film deposition buildup.
Components for CVD / LPCVD Thin Film Deposition
Quartz Bell Jar
Ø up to 450 mm · helium leak-tight
Quartz Reactor Tube
LPCVD furnace tube · ±0.5 mm
Quartz Gas Injector
Multi-port · precision hole diameter ±0.01 mm
Quartz Baffle / Liner
Flow uniformity optimization