FUSED QUARTZ
Quartz Cleaning Tank
Welded fused quartz wet cleaning vessels for HF, SC-1, SC-2, and piranha semiconductor cleaning processes — single and cascade configurations, custom sizes.
Individuelle Abmessungen und Spezifikationen auf Anfrage möglich.
Quartz Wet Cleaning Tanks
Quartz cleaning tanks are the primary containment vessel for wet chemical processing in semiconductor wafer fabrication. The tanks hold HF-based cleaning solutions (DHF, BHF), RCA cleaning chemistries (SC-1: NH₄OH/H₂O₂; SC-2: HCl/H₂O₂), sulfuric-peroxide mixtures (SPM / piranha), and DI water rinse baths.
Fused quartz is the material of choice because it is chemically inert to all these chemistries (except concentrated HF above 80°C), does not leach metallic contamination, and can be ultrasonically transduced for megasonic cleaning applications.
Standard Tank Configurations
Open-Top Single Tank
Rectangular welded box, open top, for manual or robotic wafer immersion.
| Wafer Size | Internal Dim. (L×W×H) | Wall | Holds |
|---|---|---|---|
| 4” cassette | 160 × 130 × 200 mm | 5 mm | 1 cassette |
| 6” cassette | 210 × 175 × 250 mm | 6 mm | 1 cassette |
| 8” cassette | 260 × 225 × 300 mm | 7 mm | 1 cassette |
| 12” cassette | 380 × 340 × 380 mm | 8 mm | 1 cassette |
| Custom | Per specification | 5–10 mm | Per spec |
All internal surfaces: fire-polished or mechanically polished to Ra ≤ 0.8 μm for easy cleaning.
Cascade / Overflow Rinse Tank
Tiered tanks with overflow weirs for continuous DI water rinsing. Chemical-to-DI water carry-over is eliminated by the cascade design.
- Integral overflow lip on one or both long sides
- Drain port with quartz fitting (Swagelok-compatible)
- Level sensor bosses (optional)
Megasonic Tank
Bottom-plate thickness and geometry engineered for megasonic transducer bonding (750 kHz or 1 MHz). Supplied to megasonic system integrator’s specification.
Chemical Compatibility
| Chemical | Service Condition | Compatibility |
|---|---|---|
| DHF (1–49% HF) | Room temperature | Excellent |
| BHF (buffered HF) | Room temperature | Excellent |
| Concentrated HF | > 80°C | Slow attack — limit temp |
| SC-1 (NH₄OH/H₂O₂/H₂O) | 60–80°C | Excellent |
| SC-2 (HCl/H₂O₂/H₂O) | 60–80°C | Excellent |
| H₂SO₄ / H₂O₂ (Piranha) | 120–150°C | Excellent |
| HNO₃ | Any temperature | Excellent |
| DI Water | Any temperature | Excellent |
Construction & Quality
All joints are oxy-hydrogen fusion welded by certified operators. Post-weld:
- Full annealing of assembled tank (birefringence < 10 nm/cm)
- He leak test on all weld seams (< 1×10⁻⁹ mbar·L/s)
- Dimensional inspection (internal dimensions ±1 mm)
- Visual inspection (no inclusions > 0.5 mm within 20 mm of welds)
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