By Semiconductor Process
Diffusion & Oxidation
High-temperature quartz components for dopant diffusion and thermal oxidation processes. Requires ultra-high purity and long-term dimensional stability above 1100°C.
Components for Diffusion & Oxidation
Quartz Diffusion Tube (Process Tube)
Ø 100–300 mm · L up to 2000 mm · ±0.5 mm dia.
Quartz Furnace Tube (Outer Tube)
Standard 4", 6", 8", 12" wafer compatibility
Quartz Wafer Boat
25–200 slot capacity · 4"–12" wafer sizes
Quartz Boat Rack / Carrier
Horizontal & vertical orientations
Quartz Flange
KF / CF / custom flange standards