FUSED QUARTZ
Quartz Viewport Window
Optically polished fused quartz and sapphire viewport windows for semiconductor process chamber monitoring — UV to mid-IR transmission, hermetic metal or CF flanges.
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Quartz & Sapphire Viewport Windows
Viewport windows allow optical access to semiconductor process chambers for endpoint detection, optical emission spectroscopy (OES), pyrometry, laser heating, and visual inspection — without compromising chamber vacuum or gas purity.
Window Material Selection
| Property | Fused Quartz | Synthetic Fused Silica | Sapphire |
|---|---|---|---|
| Transmission range | 150 nm – 3.5 μm | 150 nm – 3.5 μm | 140 nm – 6 μm |
| Max use temperature | 1200°C | 1200°C | 1900°C |
| Chemical resistance (plasma) | Excellent | Excellent | Superior |
| Purity (trace metals) | < 20 ppm | < 50 ppb | N/A (single crystal) |
| Achievable Ra | < 0.5 nm | < 0.5 nm | < 0.1 nm |
| Best use case | General monitoring | High-purity CVD | Plasma + high-temp |
Unmounted Windows (Blanks)
Polished window blanks without flanges — for customer-integration into existing viewport assemblies.
| Specification | Standard | Precision |
|---|---|---|
| Diameter tolerance | ±0.05 mm | ±0.02 mm |
| Thickness tolerance | ±0.05 mm | ±0.02 mm |
| Surface roughness (both faces) | Ra 0.5–2 nm | Ra < 0.5 nm |
| Flatness (surface form) | λ/4 | λ/10 |
| Parallelism | < 3 arc-min | < 1 arc-min |
| Edge chamfer | 0.3–0.5 mm × 45° | 0.1–0.3 mm × 45° |
| Clear aperture | ≥ 85% of diameter | ≥ 90% of diameter |
Flanged Viewport Assemblies
Complete viewport assemblies with metal flanges for direct bolt-on installation to chamber walls.
| Flange Type | Description | Leak Rate |
|---|---|---|
| CF (ConFlat) flange | UHV-rated metal knife-edge seal | < 1×10⁻¹⁰ mbar·L/s |
| ISO-KF flange | Quick-release O-ring seal | < 1×10⁻⁸ mbar·L/s |
| Custom bolt-pattern flange | Per customer drawing | Per spec |
Window-to-flange attachment methods: optical contact bonding, metallic indium seal, or brazed (sapphire only).
Anti-Reflection Coatings
AR coatings are available for specific wavelength applications:
| Coating | Wavelength | Reflectance | Application |
|---|---|---|---|
| Single-layer MgF₂ | Broadband VIS | < 1% per face | General monitoring |
| V-coat | 193 nm (ArF) | < 0.5% per face | DUV lithography monitoring |
| V-coat | 248 nm (KrF) | < 0.5% per face | KrF process monitoring |
| V-coat | 532 / 1064 nm | < 0.2% per face | Laser pyrometry |
| Dual-band | 355 + 1064 nm | < 0.5% per face | Multi-wavelength systems |
Typical Applications
- OES endpoint detection — plasma etch process control
- Pyrometry windows — temperature measurement via IR transmission
- Laser heating observation ports — RTP, annealing
- In-situ reflectometry — CVD film thickness monitoring
- UV process monitoring — DUV lamp-based cleaning/curing systems