Quartz Cleaning Tank

FUSED QUARTZ

Quartz Cleaning Tank

Welded fused quartz wet cleaning vessels for HF, SC-1, SC-2, and piranha semiconductor cleaning processes — single and cascade configurations, custom sizes.

Custom dimensions and specifications available upon request.

Quartz Wet Cleaning Tanks

Quartz cleaning tanks are the primary containment vessel for wet chemical processing in semiconductor wafer fabrication. The tanks hold HF-based cleaning solutions (DHF, BHF), RCA cleaning chemistries (SC-1: NH₄OH/H₂O₂; SC-2: HCl/H₂O₂), sulfuric-peroxide mixtures (SPM / piranha), and DI water rinse baths.

Fused quartz is the material of choice because it is chemically inert to all these chemistries (except concentrated HF above 80°C), does not leach metallic contamination, and can be ultrasonically transduced for megasonic cleaning applications.


Standard Tank Configurations

Open-Top Single Tank

Rectangular welded box, open top, for manual or robotic wafer immersion.

Wafer SizeInternal Dim. (L×W×H)WallHolds
4” cassette160 × 130 × 200 mm5 mm1 cassette
6” cassette210 × 175 × 250 mm6 mm1 cassette
8” cassette260 × 225 × 300 mm7 mm1 cassette
12” cassette380 × 340 × 380 mm8 mm1 cassette
CustomPer specification5–10 mmPer spec

All internal surfaces: fire-polished or mechanically polished to Ra ≤ 0.8 μm for easy cleaning.


Cascade / Overflow Rinse Tank

Tiered tanks with overflow weirs for continuous DI water rinsing. Chemical-to-DI water carry-over is eliminated by the cascade design.

  • Integral overflow lip on one or both long sides
  • Drain port with quartz fitting (Swagelok-compatible)
  • Level sensor bosses (optional)

Megasonic Tank

Bottom-plate thickness and geometry engineered for megasonic transducer bonding (750 kHz or 1 MHz). Supplied to megasonic system integrator’s specification.


Chemical Compatibility

ChemicalService ConditionCompatibility
DHF (1–49% HF)Room temperatureExcellent
BHF (buffered HF)Room temperatureExcellent
Concentrated HF> 80°CSlow attack — limit temp
SC-1 (NH₄OH/H₂O₂/H₂O)60–80°CExcellent
SC-2 (HCl/H₂O₂/H₂O)60–80°CExcellent
H₂SO₄ / H₂O₂ (Piranha)120–150°CExcellent
HNO₃Any temperatureExcellent
DI WaterAny temperatureExcellent

Construction & Quality

All joints are oxy-hydrogen fusion welded by certified operators. Post-weld:

  • Full annealing of assembled tank (birefringence < 10 nm/cm)
  • He leak test on all weld seams (< 1×10⁻⁹ mbar·L/s)
  • Dimensional inspection (internal dimensions ±1 mm)
  • Visual inspection (no inclusions > 0.5 mm within 20 mm of welds)

Ready to order or need a custom size?

Submit your drawing or specifications — we respond within 24 hours.

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