FUSED QUARTZ
Quartz Cleaning Tank
Welded fused quartz wet cleaning vessels for HF, SC-1, SC-2, and piranha semiconductor cleaning processes — single and cascade configurations, custom sizes.
Dimensiones y especificaciones personalizadas disponibles bajo pedido.
Quartz Wet Cleaning Tanks
Quartz cleaning tanks are the primary containment vessel for wet chemical processing in semiconductor wafer fabrication. The tanks hold HF-based cleaning solutions (DHF, BHF), RCA cleaning chemistries (SC-1: NH₄OH/H₂O₂; SC-2: HCl/H₂O₂), sulfuric-peroxide mixtures (SPM / piranha), and DI water rinse baths.
Fused quartz is the material of choice because it is chemically inert to all these chemistries (except concentrated HF above 80°C), does not leach metallic contamination, and can be ultrasonically transduced for megasonic cleaning applications.
Standard Tank Configurations
Open-Top Single Tank
Rectangular welded box, open top, for manual or robotic wafer immersion.
| Wafer Size | Internal Dim. (L×W×H) | Wall | Holds |
|---|---|---|---|
| 4” cassette | 160 × 130 × 200 mm | 5 mm | 1 cassette |
| 6” cassette | 210 × 175 × 250 mm | 6 mm | 1 cassette |
| 8” cassette | 260 × 225 × 300 mm | 7 mm | 1 cassette |
| 12” cassette | 380 × 340 × 380 mm | 8 mm | 1 cassette |
| Custom | Per specification | 5–10 mm | Per spec |
All internal surfaces: fire-polished or mechanically polished to Ra ≤ 0.8 μm for easy cleaning.
Cascade / Overflow Rinse Tank
Tiered tanks with overflow weirs for continuous DI water rinsing. Chemical-to-DI water carry-over is eliminated by the cascade design.
- Integral overflow lip on one or both long sides
- Drain port with quartz fitting (Swagelok-compatible)
- Level sensor bosses (optional)
Megasonic Tank
Bottom-plate thickness and geometry engineered for megasonic transducer bonding (750 kHz or 1 MHz). Supplied to megasonic system integrator’s specification.
Chemical Compatibility
| Chemical | Service Condition | Compatibility |
|---|---|---|
| DHF (1–49% HF) | Room temperature | Excellent |
| BHF (buffered HF) | Room temperature | Excellent |
| Concentrated HF | > 80°C | Slow attack — limit temp |
| SC-1 (NH₄OH/H₂O₂/H₂O) | 60–80°C | Excellent |
| SC-2 (HCl/H₂O₂/H₂O) | 60–80°C | Excellent |
| H₂SO₄ / H₂O₂ (Piranha) | 120–150°C | Excellent |
| HNO₃ | Any temperature | Excellent |
| DI Water | Any temperature | Excellent |
Construction & Quality
All joints are oxy-hydrogen fusion welded by certified operators. Post-weld:
- Full annealing of assembled tank (birefringence < 10 nm/cm)
- He leak test on all weld seams (< 1×10⁻⁹ mbar·L/s)
- Dimensional inspection (internal dimensions ±1 mm)
- Visual inspection (no inclusions > 0.5 mm within 20 mm of welds)
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